Nanometrics Incorporated NANO, today announced that its IMPULSE integrated metrology
optical critical dimension and film analysis system has been selected by
a major Korean memory manufacturer for chemical mechanical planarization
process control. The decision makes the Nanometrics IMPULSE system
“tool-of-record” for CMP control of NAND Flash memory in high-volume
manufacturing at the 2x nm node. The IMPULSE was selected over competitive
offerings following an extended technical evaluation.
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